VMIC
- September 6-10, 1999
Kristan
G. Bahten, Dan McMullen, Yassin Mehmandoust
Rippey
Corporation
5000 Hillsdale Circle
El Dorado Hills, CA 95762
2Oliver
Design
Inc. 5 Victor Square
Scotts Valley, CA 95066
Executive
Summary
PVA
brush scrubbing technology is the most common form of cleaning
in post-CMP applications1. Although there have been
numerous papers published on the science of brush scrubbing,
few have addressed the brush itself. During semiconductor manufacturing,
the PVA brush is one of the few solid objects, which comes into
direct contact with the face of the wafer. Cleaning performance
during brush scrubbing is not only dependent on the chemistries
used and the tool design, but also on the physical properties
of the brush material2.
Data
will be presented to demonstrate the performance differences
and advantages of flow-through technology, flow dynamics of
flow-through cores and the benefits of disposable brush sleeves.
Also discussed will be how those improvements will potentially
impact the economics of manufacturing.
Extended
Abstract
The
current technology for the introduction of cleaning solutions,
in post-CMP brush scrubbing operations in the semiconductor
and silicon manufacturing industries, is the use of flow-through
brush mandrel (brush core) techniques. In this approach, a hollow
core with perforations forms the brush support. DI water or
cleaning chemistries are delivered onto the PVA brush through
the core. The solution then flows from the inside, through the
brush, and is evenly distributed to the surface being cleaned.
Not only will this provide a better distribution of the cleaning
solution, but also improves performance and increases brush
life. Liquid flow through the brush helps to reduce particle
build up (brush loading) on the brush, thereby extending the
useful life-time of the brush and reducing the cost of ownership
for the scrubbing process.
This
paper presents liquid flow dynamics data and advantages between
flow-through technology compared to spray or drip techniques,
and the influence of material structure of the PVA brush material.
Some of the particle and brush flow data generated for this
paper was obtained on disk media utilizing an Oliver Design
disk scrubber.
Pore
Structure
The
manufacturing techniques used for pore formation in the PVA
sponge material can have a significant effect on the flow performance
and characteristics. Common methods for sponge manufacturing
are based on gas formation or gas injection (foaming technique).
The Rippey/Kanebo PVA sponge material uses a unique technique
of reactive phase separation for the formation of pores. This
method consists of adding a pore-forming agent to the liquid
polymer mixture. As the polymer is converted to its non-soluble
state, the pore-forming agent assist is the stabilization of
the developing insoluble polymer network and contributes to
exclusion volume of the pores. The resulting differences in
pore structure/distribution are shown below (Figure 1).
Figure
1. SEM’s of Rippey Microclean vs. Air Formed Product Internal
Pore Structure
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Rippey
Brush x50
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Air
Formed Brush x50
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As
can be seen from the above photographs of the internal pore
structure, the reactive phase separation techniques produce
a highly consistent and open cell structure. The advantages
of this method are tighter control of porosity, higher consistency
and a much more open cell structure. The uniform and open architecture
will result in higher flow and lower backpressure with a uniform
flux over the surface. Air or gas formation (foaming) produces
a higher concentration of closed cell pores and a less consistent
pore distribution due to the difficulty in controlling the distribution
of air bubbles.
Core
Design and Flow-through
The
unique pore structure created by reactive phase separation is
most beneficial when using flow-through techniques. Flow-through
brush cores can offer distinct advantages over solid core designs.
With liquid or cleaning solutions flowing through from the inside,
the brush is continually rinsed from the inside out. This technique
will substantially reduce the effect of brush loading as demonstrated
in Figure 2. This experiment was conducted on an Oliver Design
dual rail disk scrubber equipped with a new flow-through core.
The brushes were dipped into diamond slurry prior to scrubbing
polished disk media. The experiment was conducted both with
and without flow-through. The DI water flow to the cores was
set at 0.95 gpm for a set of four brushes. This experiment measured
the number of runs before the slurry was removed and particle
adders returned to baseline.
Flow
performance
Some
preliminary experiments have been conducted on the flow characteristics
of the PVA brush
when used in conjunction with the flow-through core. The total
flow through the core
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Time
to remove slurry from brushes
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Effect
of brush on total liquid flow
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was
measured at varying rotational velocities (0 – 1000 rpm) for
15 seconds, both with and without brushes installed. It should
be noted that some of the rpms are much higher than commonly
used in post-CMP cleaning. The results are detailed in Figure
3. The initial line pressure feeding the cores was 25psi with
a flow of 0.95 gpm. With no rotation, the total flow measured
was the approximately the same for cores with and without brushes.
This would indicate that at relatively low flow (a flux of 0.578
ml/cm2 • sec) the brush offers little resistance.
What was not expected from this experiment was a drop in flow
with brushes installed as the rotational velocity increased.
As with the core itself, we had expected an increase in flow
from the added centrifugal force. This is only preliminary data,
but it appears to indicate that the brush has higher backpressure
as the rotational velocity increases. This could be caused by
several possible factors, which would need further investigation: