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1982
1984
1989
1990
1993
1997
1998
2001
2003
2004
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Introduced PVA For Critical Cleaning Applications
Introduced Polishing Pads For Critical Polishing Applications
Introduced Cabot Colloidal Silica For Bare Wafer Polish
Recognized By Inc. Magazine As One Of The 100 Fastest Growing US Companies
Worldwide Headquarters Relocated To El Dorado Hills, CA
Acquired Tritec Industries & Introduced
Chemical and DI Water Heaters
Introduction Of Lam/OnTrak Post-CMP Double-Sided
Scrubber
Developed Slurry & Process Of Record With SEMATECH For Oxide CMP
Introduced Patented Microclean Process For PVA
Brush Roller Products
Developed Process Of Record With SEMATECH For Cu Post-CMP Cleaning Global
Facilities Established In Singapore, Japan and Europe
Introduced Technologically Advanced Symmetry PVA Product Portfolio
Becomes Member-NSF/SRC Engineering Research Center
Introduces next generation technology designed to meet
advanced process applications for cu post-CMP cleaning...Rippey Microclean F2
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